Сайты ТУСУРа

Development of a High Current Protection Device against Ultrashort Pulse

Статья в сборнике трудов конференции

The article presents the results of the development of an interfering ultrashort pulse (USP) protection device. It is a modal filter (MF) with a broadside coupling on a ceramic substrate of aluminium oxide (Al2O3). Preliminary quasi-static simulation has been carried out to select cross-section parameters, termination loads on the passive conductors, and to calculate coupling coefficients and maximum possible duration of the USP. Based on these results, we make a prototype MF. A compare of its electrical parameters, obtained with quasi-static simulation and a Rohde & Schwarz HM8118 LCR meter, showed a deviation of no more than 0.64%. The experiment was carried out with a Panorama P4226 vector network analyser and confirmed by electrodynamic simulation in ADS software. For the time domain research, the following were used: a digitised step recovery diode (SRD) ultrashort pulse generator signal of 300 ps with a duration of 0.5 and amplitude of e.m.f. 500 mV and electro static discharge (ESD) current waveform and amplitude in accordance with IEC 61000-4-2. The result of the experiment for the MF was a cut-off frequency of 66 MHz at minus 3 dB, and a maximum output amplitude of 37 mV, equivalent to an attenuation coefficient of 6.75 times. When excitation to ESD, the maximum amplitude decreased by 1.92 times. The signal-to-noise ratio at the MF cut-off frequency is also calculated and the eye diagram is plotted.

Библиографическая запись: Kosteletskii, V. P. Development of a high current protection device against ultrashort pulse [Electronic resource] / V. P. Kosteletskii, E. B. Chernikova, A. M. Zabolotsky // International Conference on Industrial Engineering, Applications and Manufacturing (ICIEAM) (Sochi, 15-19 May 2023). – New York City : IEEE, 2023. – P. 312-316. – DOI: 10.1109/ICIEAM57311.2023.10139254

Конференция:

  • International Conference on Industrial Engineering, Applications and Manufacturing (ICIEAM)
  • Россия, Краснодарский край, Сочи, 15-19 мая 2023,
  • Международная

Издательство:

IEEE

США, New York, New York City

Год издания:  2023
Страницы:  312 - 316
Язык:  Английский
DOI:  10.1109/ICIEAM57311.2023.10139254