Influence of gas discharge plazma on films of complex composition forming process and properties

Статья в сборнике трудов конференции

In this paper, we present the research results on the formation mechanism of stoichiometric compounds of complex thin films formed by ion-plasma sputtering in reactive gases environment. The kinetics of complex films’ formation and growth is studied as well as the change in characteristics of microelectronics elements formed on the basis of thin films during their electron-ion bombardment.

Библиографическая запись: Zhidik, Y. S. Influence of gas discharge plazma on films of complex composition forming process and properties / Y. S. Zhidik [et. al.] // Proceeding 14th International Conference "Gas Discharge Plasmas and Their Applications" (GDP 2019) (15–21 September 2019, Tomsk, Russia). - Tomsk: TPU Publishing House, 2019. - P. 202

Ключевые слова:

ELECTRON-ION BOMBARDMENT ION-PLASMA SPUTTERING

Конференция:

14th International Conference "Gas Discharge Plasmas and Their Applications" GDP 2019
Россия, Томская область, Томск, 15-21 сентября 2019,
Международная

Издательство:

TPU Publishing House

Россия, Томская область, Томск

Авторы: Жидик Ю. С., Данилина Т. И., Чистоедова А. А., Жидик Е. В., Троян П. Е., Битнер Л. Р.

Год издания: 2019

Страницы: 202 - 202

Язык: Английский