Electron beam evaporation of boron at forevacuum pressures for plasma-assisted deposition of boron-containing coatings

Статья в журнале

We describe the use of a plasma-cathode electron source for electron beam evaporation of boron at forevacuum pressures (10 Pa) with subsequent deposition of boron-containing coatings on a titanium substrate. We analyze the process of electron beam heating and evaporation of boron, study the mass-to-charge composition of the gas and boron beam-produced plasma, apply such plasma for coating deposition, and investigate the elemental composition of the deposited film and its microhardness.

Журнал:

Journal of Applied Physics
American Institute of Physics (College Park)

Библиографическая запись: Electron beam evaporation of boron at forevacuum pressures for plasma-assisted deposition of boron-containing coatings / Y. G. Yushkov [et. al.] // Journal of Applied Physics. – 2016. – Vol. 120. – Issue. 23. – С. 233302–233302. – DOI: 10.1063/1.4972268

Ключевые слова:

COATING DEPOSITION ELECTRON BEAM EVAPORATION PLASMA ASSISTED DEPOSITION TITANIUM SUBSTRATES BORON-CONTAINING CHARGE COMPOSITION

Индексируется в:

Авторы: Юшков Ю. Г., Тюньков А. В., Окс Е. М., Золотухин Д. Б.

Год издания: 2016

Страницы: 233302 - 233302

Язык: Английский

DOI: 10.1063/1.4972268