Influence of gas discharge plasma on forming process and properties of complex films

Статья в журнале

In this paper, we present the research results on the formation mechanism of stoichiometric compounds of complex thin films formed by ion-plasma sputtering in reactive gases environment. The kinetics of complex films’ formation and growth is studied as well as the change in characteristics of microelectronics elements formed on the basis of thin films during their electron-ion bombardment.

Журнал:

• Journal of Physics: Conference Series
• Institute of Physics Publishing (Briston)
• Индексируется в Scopus

Библиографическая запись: Influence of gas discharge plasma on forming process and properties of complex films / Y. S. Zhidik [et. al.] // Journal of Physics: Conference Series. - 2019. Vol. 1393. - P. 012154. - DOI: 10.1088/1742-6596/1393/1/012154